An open-access pure-play lithium niobate foundry
Multi Project Wafers Custom Runs

Proprietary “deep-etch” technology

80º sidewalls for up to 900nm thickness of LiNbO3 etching (loss < 0.3 dB/cm)

Wafer-scale fabrication

Photonic and RF circuits with scalable and high throughput fabrication techniques.

Verified PDK

Our patented deep etching process allows extremely accurate dimensional control (40 nm tolerance) that facilitates a reliable Process Design Kit (PDK) library. Our PDK allows system-level design of photonic integrated circuits (PICs).

Lithium Niobate Wafer

MPW runs

We offer Multi Project Wafer (MPW) runs that are either base-on or compatible with our PDK stack.

Dedicated Runs

We process dedicated wafer runs based on customs designs or our PDK.

Optical & RF testing

Our fully-automated characterization setups allow full-chip optical and RF characterization.


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